| Density multiplication and improved lithography by directed block copolymer assembly R Ruiz, H Kang, FA Detcheverry, E Dobisz, DS Kercher, TR Albrecht, ... Science 321 (5891), 936-939, 2008 | 1425 | 2008 |
| Low voltage electron beam lithography in self‐assembled ultrathin films with the scanning tunneling microscope CRK Marrian, FK Perkins, SL Brandow, TS Koloski, EA Dobisz, JM Calvert Applied physics letters 64 (3), 390-392, 1994 | 204 | 1994 |
| Separating dipolar broadening from the intrinsic switching field distribution in perpendicular patterned media O Hellwig, A Berger, T Thomson, E Dobisz, ZZ Bandic, H Yang, ... Applied Physics Letters 90 (16), 2007 | 194 | 2007 |
| Reversal mechanisms in perpendicularly magnetized nanostructures JM Shaw, SE Russek, T Thomson, MJ Donahue, BD Terris, O Hellwig, ... Physical Review B 78 (2), 024414, 2008 | 166 | 2008 |
| Bit patterned media based on block copolymer directed assembly with narrow magnetic switching field distribution O Hellwig, JK Bosworth, E Dobisz, D Kercher, T Hauet, G Zeltzer, ... Applied Physics Letters 96 (5), 2010 | 160 | 2010 |
| Directed self-assembly of diblock copolymer thin films on chemically-patterned substrates for defect-free nano-patterning Y Tada, S Akasaka, H Yoshida, H Hasegawa, E Dobisz, D Kercher, ... Macromolecules 41 (23), 9267-9276, 2008 | 134 | 2008 |
| Rectangular patterns using block copolymer directed assembly for high bit aspect ratio patterned media R Ruiz, E Dobisz, TR Albrecht Acs Nano 5 (1), 79-84, 2011 | 133 | 2011 |
| Coercivity tuning in Co/Pd multilayer based bit patterned media O Hellwig, T Hauet, T Thomson, E Dobisz, JD Risner-Jamtgaard, D Yaney, ... Applied Physics Letters 95 (23), 2009 | 124 | 2009 |
| Patterned media: nanofabrication challenges of future disk drives EA Dobisz, ZZ Bandic, TW Wu, T Albrecht Proceedings of the IEEE 96 (11), 1836-1846, 2008 | 115 | 2008 |
| Sub‐30 nm lithography in a negative electron beam resist with a vacuum scanning tunneling microscope EA Dobisz, CRK Marrian Applied physics letters 58 (22), 2526-2528, 1991 | 107 | 1991 |
| Directed self-assembly of POSS containing block copolymer on lithographically defined chemical template with morphology control by solvent vapor Y Tada, H Yoshida, Y Ishida, T Hirai, JK Bosworth, E Dobisz, R Ruiz, ... Macromolecules 45 (1), 292-304, 2012 | 106 | 2012 |
| Bit Patterned Media at 1 Tdot/in2 and Beyond TR Albrecht, D Bedau, E Dobisz, H Gao, M Grobis, O Hellwig, D Kercher, ... IEEE Transactions on Magnetics 49 (2), 773-778, 2013 | 105 | 2013 |
| Electron‐beam lithography with the scanning tunneling microscope CRK Marrian, EA Dobisz, JA Dagata Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1992 | 103 | 1992 |
| Effects of molecular properties on nanolithography in polymethyl methacrylate EA Dobisz, SL Brandow, R Bass, J Mitterender Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000 | 101 | 2000 |
| Fabrication of 15 nm wide trenches in Si by vacuum scanning tunneling microscope lithography of an organosilane self‐assembled film and reactive ion etching FK Perkins, EA Dobisz, SL Brandow, JM Calvert, JE Kosakowski, ... Applied physics letters 68 (4), 550-552, 1996 | 86 | 1996 |
| Aluminum ion‐implantation enhanced intermixing of GaAs‐AlGaAs quantum‐well structures K Kash, B Tell, P Grabbe, EA Dobisz, HG Craighead, MC Tamargo Journal of applied physics 63 (1), 190-194, 1988 | 83 | 1988 |
| Role of reversal incoherency in reducing switching field and switching field distribution of exchange coupled composite bit patterned media T Hauet, E Dobisz, S Florez, J Park, B Lengsfield, BD Terris, O Hellwig Applied Physics Letters 95 (26), 2009 | 81 | 2009 |
| Proximal probe study of self‐assembled monolayer resist materials FK Perkins, EA Dobisz, SL Brandow, TS Koloski, JM Calvert, KW Rhee, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1994 | 73 | 1994 |
| Generation and control of ultrashort-wavelength two-dimensional surface acoustic waves at nanoscale interfaces Q Li, K Hoogeboom-Pot, D Nardi, MM Murnane, HC Kapteyn, ... Physical Review B 85 (19), 195431, 2012 | 72 | 2012 |
| Image quality and pattern transfer in directed self assembly with block-selective atomic layer deposition R Ruiz, L Wan, J Lille, KC Patel, E Dobisz, DE Johnston, K Kisslinger, ... Journal of Vacuum Science & Technology B 30 (6), 2012 | 64 | 2012 |
