Mohammad Ali Mohammad
Mohammad Ali Mohammad
National University of Sciences and Technology, Islamabad
Verified email at - Homepage
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A Graphene-Based Resistive Pressure Sensor with Record-High Sensitivity in a Wide Pressure Range
H Tian, Y Shu, XF Wang, MA Mohammad, Z Bie, QY Xie, C Li, WT Mi, ...
Scientific Reports 5, 8603, 2015
Novel Field-Effect Schottky Barrier Transistors Based on Graphene-MoS2 Heterojunctions
H Tian, Z Tan, C Wu, X Wang, MA Mohammad, D Xie, Y Yang, J Wang, ...
Scientific Reports 4, 5951, 2014
Surface acoustic wave devices for sensor applications
L Bo, C Xiao, C Hualin, MA Mohammad, T Xiangguang, T Luqi, Y Yi, ...
Journal of Semiconductors 37 (2), 021001, 2016
Fundamentals of Electron Beam Exposure and Development
MA Mohammad, M Muhammad, SK Dew, M Stepanova
Nanofabrication, 11-41, 2011
A spectrally tunable all-graphene-based flexible field-effect light-emitting device
X Wang, H Tian, MA Mohammad, C Li, C Wu, Y Yang, TL Ren
Nature communications 6, 7767, 2015
Cost-Effective, Transfer-Free, Flexible Resistive Random Access Memory Using Laser-Scribed Reduced-Graphene-Oxide Patterning Technology
H Tian, HY Chen, TL Ren, C Li, QT Xue, MA Mohammad, C Wu, Y Yang, ...
Nano Letters 14 (6), 3214-3219, 2014
Graphene Earphones: Entertainment for Both Humans and Animals
H Tian, C Li, MA Mohammad, YL Cui, WT Mi, Y Yang, D Xie, TL Ren
ACS Nano 8 (6), 5883–5890, 2014
A novel artificial synapse with dual modes using bilayer graphene as the bottom electrode
H Tian, W Mi, H Zhao, MA Mohammad, Y Yang, PW Chiu, TL Ren
Nanoscale 9 (27), 9275-9283, 2017
Observation of a giant two-dimensional band-piezoelectric effect on biaxial-strained graphene
X Wang, H Tian, W Xie, Y Shu, WT Mi, MA Mohammad, QY Xie, Y Yang, ...
NPG Asia Materials 7 (1), e154, 2015
Comparison between ZEP and PMMA resists for nanoscale electron beam lithography experimentally and by numerical modeling
K Koshelev, MA Mohammad, T Fito, KL Westra, SK Dew, M Stepanova
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2011
In Situ Tuning of Switching Window in a Gate‐Controlled Bilayer Graphene‐Electrode Resistive Memory Device
H Tian, H Zhao, XF Wang, QY Xie, HY Chen, MA Mohammad, C Li, WT Mi, ...
Advanced Materials 27 (47), 7767-7774, 2015
A hardware Markov chain algorithm realized in a single device for machine learning
H Tian, XF Wang, MA Mohammad, GY Gou, F Wu, Y Yang, TL Ren
Nature communications 9 (1), 4305, 2018
Study of development processes for ZEP-520 as a high-resolution positive and negative tone electron beam lithography resist
MA Mohammad, K Koshelev, T Fito, DAZ Zheng, M Stepanova, S Dew
Japanese Journal of Applied Physics 51 (6S), 06FC05, 2012
Tunable graphene oxide reduction and graphene patterning at room temperature on arbitrary substrates
NQ Deng, H Tian, ZY Ju, HM Zhao, C Li, MA Mohammad, LQ Tao, Y Pang, ...
Carbon 109, 173-181, 2016
A flexible, transparent and ultrathin single-layer graphene earphone
He Tian, Yi Yang, Cheng Li, Wen-Tian Mi, Mohammad Ali Mohammad, and Tian ...
RSC Advances 5 (22), 17366-17371, 2015
Systematic study of the interdependence of exposure and development conditions and kinetic modelling for optimizing low-energy electron beam nanolithography
MA Mohammad, T Fito, J Chen, S Buswell, M Aktary, M Stepanova, ...
Microelectronic Engineering 87 (5-8), 1104-1107, 2010
High performance lithium niobate surface acoustic wave transducers in the 4–12 GHz super high frequency range
X Chen, MA Mohammad, J Conway, B Liu, Y Yang, TL Ren
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2015
Fabrication of sub-10 nm silicon carbon nitride resonators using a hydrogen silsesquioxane mask patterned by electron beam lithography
MA Mohammad, SK Dew, S Evoy, M Stepanova
Microelectronic Engineering 88 (8), 2338–2341, 2010
Interdependence of optimum exposure dose regimes and the kinetics of resist dissolution for electron beam nanolithography of polymethylmethacrylate
MA Mohammad, T Fito, J Chen, M Aktary, M Stepanova, SK Dew
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2010
SML resist processing for high-aspect-ratio and high-sensitivity electron beam lithography
MA Mohammad, SK Dew, M Stepanova
Nanoscale Research Letters 8 (1), 139, 2013
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