Ultrafast Assembly of PS‐PDMS Block Copolymers on 300 mm Wafers by Blending with Plasticizers J Arias‐Zapata, S Böhme, J Garnier, C Girardot, A Legrain, M Zelsmann Advanced Functional Materials 26 (31), 5690-5700, 2016 | 30 | 2016 |
Controllable elastocapillary folding of three-dimensional micro-objects by through-wafer filling A Legrain, TG Janson, JW Berenschot, L Abelmann, NR Tas Journal of Applied Physics 115 (21), 2014 | 26 | 2014 |
Straightforward Integration Flow of a Silicon-Containing Block Copolymer for Line–Space Patterning A Legrain, G Fleury, M Mumtaz, C Navarro, J Arias-Zapata, X Chevalier, ... ACS applied materials & interfaces 9 (49), 43043-43050, 2017 | 22 | 2017 |
Engineering self-assembly of a high-χ block copolymer for large-area fabrication of transistors based on functional graphene nanoribbon arrays J Arias-Zapata, JD Garnier, HA Mehedi, A Legrain, B Salem, G Cunge, ... Chemistry of Materials 31 (9), 3154-3162, 2019 | 18 | 2019 |
Capillary origami of micro-machined micro-objects: Bi-layer conductive hinges A Legrain, JW Berenschot, NR Tas, L Abelmann Microelectronic engineering 140, 60-66, 2015 | 13 | 2015 |
Let's twist again: elasto-capillary assembly of parallel ribbons A Legrain, EJW Berenschot, L Abelmann, J Bico, NR Tas Soft matter 12 (34), 7186-7194, 2016 | 11 | 2016 |
Recent Achievements in sub-10 nm DSA lithography for Line/Space patterning C Navarro, C Nicolet, F Ariura, X Chevalier, K Xu, MA Hockey, M Mumtaz, ... Journal of Photopolymer Science and Technology 30 (1), 69-75, 2017 | 6 | 2017 |
Micro-assembly of three dimensional tetrahedra by capillary forces JW van Honschoten, A Legrain, JW Berenschot, L Abelmann, NR Tas 2011 IEEE 24th International Conference on Micro Electro Mechanical Systems …, 2011 | 6 | 2011 |
Annealing treatments of cylindrical siloxane-based block copolymers optimized for nanomanufacturing S Böhme, J Arias-Zapata, J Garnier, C Girardot, A Legrain, M Zelsmann Micro and Nano Engineering 1, 56-62, 2018 | 4 | 2018 |
Graphoepitaxy integration and pattern transfer of lamellar silicon-containing high-chi block copolymers P Bézard, X Chevalier, A Legrain, C Navarro, C Nicolet, G Fleury, ... Advanced Etch Technology for Nanopatterning VII 10589, 39-48, 2018 | 3 | 2018 |
Elasto-Capillary Folding Using Stop-Programmable Hinges Fabricated by 3D Micro-Machining A Legrain, EJW Berenschot, NR Tas, L Abelmann Plos one 10 (5), e0125891, 2015 | 3 | 2015 |
Elastocapillary folding of three dimensional micro-structures using water pumped through the wafer via a silicon nitride tube ABH Legrain, JW Berenschot, RGP Sanders, K Ma, NR Tas, L Abelmann 22nd Micromechanics and Microsystems Europe Workshop, MME 2011, 250-253, 2011 | 1 | 2011 |
Micro and Nano Engineering S Böhme, J Arias-Zapata, J Garnier, C Girardot, A Legrain, M Zelsmann | | 2018 |
Graphoepitaxy integration and pattern transfer of lamellar silicon-containing high-chi block copolymers M Zelsmann, P Bézard, X Chevalier, A Legrain, C Navarro, C Nicolet, ... SPIE Advanced Lithography 105890, 2018 | | 2018 |
Block-copolymers performances improvement and design for DSA applications in microelectronic X Chevalier, C Nicolet, G Fleury, M Zelsmann, P Bezard, A Legrain, ... European Materials Research Society conference-E-MRS 2018, Spring Meeting, 2018 | | 2018 |
Different approaches to reduce DSA defectivity by dry-etching P Bézard, G Cunge, X Chevalier, G Lombard, A Legrain, M Zelsmann Plasma Etch and Strip for Microtechnology workshop–PESM 2017, 2017 | | 2017 |
Materials meeting electronic requirements for Sub-10 nm lithography C Navarro, C Nicolet, X Chevalier, K Xu, MA Hockey, G Fleury, ... Directed Self-Assembly Symposium–DSA 2017, 2017 | | 2017 |
Interface optimization for high-chi block copolymers materials with sub-10 nm resolution A Paquet, X Chevalier, A Legrain, M Zelsmann, G Fleury, C Nicolet, ... Micro-and Nano-Engineering conference-MNE 2017, 2017 | | 2017 |
Novel Si-containing high-χ block-copolymer for nanolithography application: PS-b-PDMSB A Legrain, J Arias-Zapata, S Böhme, C Girardot, C Navarro, G Fleury, ... Micro-and Nano-Engineering conference-MNE 2016, 2016 | | 2016 |
Si-containing high- block-copolymers for nanolithography applications A Legrain, C Girardot, X Chevalier, C Navarro, I Cayrefourcq, G Fleury, ... Directed Self-Assembly Symposium–DSA 2016, 2016 | | 2016 |