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Zhe (Ashley) Jian
Zhe (Ashley) Jian
Intel Corporation, University of Michigan
Verified email at umich.edu
Title
Cited by
Cited by
Year
Temperature-dependent current-voltage characteristics of β-Ga2O3 trench Schottky barrier diodes
ZA Jian, S Mohanty, E Ahmadi
Applied Physics Letters 116 (15), 2020
512020
Deep UV-assisted capacitance–voltage characterization of post-deposition annealed Al2O3/β-Ga2O3 (001) MOSCAPs
ZA Jian, S Mohanty, E Ahmadi
Applied Physics Letters 116 (24), 2020
192020
Chlorine-based inductive coupled plasma etching of α-Ga2O3
ZA Jian, Y Oshima, S Wright, K Owen, E Ahmadi
Semiconductor Science and Technology 34 (3), 035006, 2019
172019
β-(Al,Ga)2O3 for High Power Applications — A Review on Material Growth and Device Fabrication
A Jian, K Khan, E Ahmadi
International Journal of High Speed Electronics and Systems 28 (01n02), 1940006, 2019
142019
Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
S Mohanty, I Sayed, ZA Jian, U Mishra, E Ahmadi
Applied Physics Letters 119 (4), 2021
132021
Characterization of MOCVD-grown AlSiO gate dielectric on β-Ga2O3 (001)
ZA Jian, I Sayed, W Liu, S Mohanty, E Ahmadi
Applied Physics Letters 118 (17), 2021
132021
Switching Performance Analysis of 3.5 kV Ga2O3 Power FinFETs
ZA Jian, S Mohanty, E Ahmadi
IEEE Transactions on Electron Devices 68 (2), 672-678, 2020
132020
HfO2 as gate insulator on N-polar GaN–AlGaN heterostructures
CJ Clymore, S Mohanty, ZA Jian, A Krishna, S Keller, E Ahmadi
Semiconductor Science and Technology 36 (3), 035017, 2021
102021
Design of ultra-scaled-channel N-polar GaN HEMTs with high charge density: A systematic study of hole traps and their impact on charge density in the channel
S Mohanty, S Diez, ZA Jian, E Ahmadi
Journal of Applied Physics 128 (23), 2020
72020
Improved operational reliability of MOCVD-grown AlSiO gate dielectric on β-Ga2O3 (001) by post-metallization annealing
ZA Jian, I Sayed, S Mohanty, W Liu, E Ahmadi
Semiconductor Science and Technology 36 (9), 09LT03, 2021
62021
Demonstration of N-Polar GaN MIS-HEMT with High-k Atomic Layer Deposited HfO2 as Gate Dielectric
S Mohanty, Z Jian, K Khan, E Ahmadi
Journal of Electronic Materials 52 (4), 2596-2602, 2023
42023
Selective-area growth of GaN and AlGaN nanowires on N-polar GaN templates with 4° miscut by plasma-assisted molecular beam epitaxy
K Khan, ZA Jian, J Li, K Sun, E Ahmadi
Journal of Crystal Growth 611, 127181, 2023
22023
Demonstration of atmospheric plasma activated direct bonding of N-polar GaN and β-Ga2O3 (001) substrates
ZA Jian, CJ Clymore, K Sun, U Mishra, E Ahmadi
Applied Physics Letters 120 (14), 2022
22022
Comparative analysis of selective area grown Ga-and N-polar InGaN/GaN nanowires for quantum emitters
A Ghosh, K Khan, S Sankar, ZA Jian, S Hasan, E Ahmadi, S Arafin
AIP Advances 14 (2), 2024
2024
Electrical and Structural Analysis of β‐Ga2O3/GaN Wafer‐Bonded Heterojunctions with a ZnO Interlayer
Z Jian, K Sun, S Kosanovic, CJ Clymore, U Mishra, E Ahmadi
Advanced Electronic Materials 9 (8), 2300174, 2023
2023
A systematic study of interfacial property of HfO2 gate dielectric on N‐polar GaN
S Mohanty, I Sayed, ZA Jian, U Mishra, E Ahmadi
79th Device Research Conference (DRC 2021), 2021
2021
Electrical Properties of MOCVD-Grown AlSiO Gate Dielectric on (001) β-Ga2O3
ZA Jian, I Sayed, W Liu, S Mohanty, E Ahmadi
63rd Electronic Materials Conference (EMC 2021), 2021
2021
Deep UV-assisted C-V Characterization of Post-deposition Annealed Al2O3/β-Ga2O3 (001) MOSCAPs
ZA Jian, S Mohanty, E Ahmadi
78th Device Research Conference (DRC 2020), 2020
2020
Design of Ultra-Scaled Channel N-Polar GaN HEMTs with High Charge Density Using AlN-GaN Superlattice as the Backbarrier
S Mohanty, SD Penzon, ZA Jian, E Ahmadi
62nd Electronic Materials Conference (EMC 2020), 2020
2020
Epitaxial Growth of relaxed InGaN films on Zn-face ZnO substrate by Plasma-Assisted Molecular Beam Epitaxy
K Khan, SD Penzon, A Jian, E Ahmadi
61st Electronic Materials Conference (EMC 2019), 2019
2019
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