Two-surface-plasmon-polariton-absorption based nanolithography Y Li, F Liu, L Xiao, K Cui, X Feng, W Zhang, Y Huang Applied Physics Letters 102 (6), 063113, 2013 | 33 | 2013 |
Extremely high efficient coupling between long range surface plasmon polariton and dielectric waveguide mode F Liu, R Wan, Y Li, Y Huang, Y Miura, D Ohnishi, J Peng Applied Physics Letters 95 (9), 091104, 2009 | 29 | 2009 |
Integrated sensor for ultra-thin layer sensing based on hybrid coupler with short-range surface plasmon polariton and dielectric waveguide B Fan, F Liu, X Wang, Y Li, K Cui, X Feng, Y Huang Applied Physics Letters 102 (6), 061109, 2013 | 23 | 2013 |
Two-surface-plasmon-polariton-absorption based lithography using 400 nm femtosecond laser Y Li, F Liu, Y Ye, W Meng, K Cui, X Feng, W Zhang, Y Huang Applied Physics Letters 104 (8), 081115, 2014 | 16 | 2014 |
Coupling between second-order mode in dielectric waveguide and fundamental mode in long range surface plasmon waveguide Y Li, F Liu, Y Huang, B Fan, R Wan Optics Communications 289, 60-63, 2013 | 3 | 2013 |
Nanolithography based on two-surface-plasmon-Polariton-Absorption Y Li, F Liu, L Xiao, Y Huang CLEO: 2013, 1-2, 2013 | 1 | 2013 |