Layout Hotspot Detection with Feature Tensor Generation and Deep Biased Learning H Yang, J Su, Y Zou, B Yu, EFY Young the 54th Annual Design Automation Conference 2017, http://dx.doi.org/10.1145 …, 2017 | 145 | 2017 |
Imbalance aware lithography hotspot detection: a deep learning approach H Yang, L Luo, J Su, C Lin, B Yu Journal of Micro Nanolithography Mems and Moems 16 (3), doi:10.1117/1.JMM.16 …, 2017 | 115 | 2017 |
Imbalance aware lithography hotspot detection: a deep learning approach H Yang, L Luo, J Su, C Lin, B Yu SPIE Advanced Lithography 2017 10148, doi:10.1117/12.2258374, 2017 | 115 | 2017 |
Time delays in two-photon ionization J Su, H Ni, A Jaroń-Becker, A Becker Physical Review Letters 113 (26), 263002, 2014 | 39 | 2014 |
Methods for training machine learning model for computation lithography Y Cao, Y Luo, YW Lu, C Been-Der, RC Howell, Y Zou, J Su, ... US Patent App. 16/970,648, 2020 | 34 | 2020 |
Numerical simulation of time delays in light-induced ionization J Su, H Ni, A Becker, A Jaroń-Becker Physical Review A 87 (3), 033420, 2013 | 28 | 2013 |
Identification of hot spots or defects by machine learning J Su, Y Zou, C Lin, S Hunsche, M Jochemsen, YW Lu, LL Cheong US Patent 11,443,083, 2022 | 21 | 2022 |
Machine learning assisted SRAF placement for full chip S Wang, J Su, Q Zhang, W Fong, D Sun, S Baron, C Zhang, C Lin, ... Photomask Technology 10451, doi: 10.1117/12.2283493, 2017 | 19 | 2017 |
Efficient full-chip SRAF placement using machine learning for best accuracy and improved consistency S Wang, S Baron, N Kachwala, C Kallingal, D Sun, V Shu, W Fong, Z Li, ... Optical Microlithography XXXI 10587, 184-192, 2018 | 18 | 2018 |
Finite-range time delays in numerical attosecond-streaking experiments J Su, H Ni, A Becker, A Jaroń-Becker Physical Review A 88 (2), 023413, 2013 | 18 | 2013 |
Attosecond-streaking time delays: Finite-range property and comparison of classical and quantum approaches J Su, H Ni, A Becker, A Jaroń-Becker Physical Review A 89 (1), 013404, 2014 | 17 | 2014 |
Training methods for machine learning assisted optical proximity error correction J Su, YW Lu, Y Luo US Patent 11,561,477, 2023 | 12 | 2023 |
Assist feature placement based on machine learning J Su, Y Zou, C Lin, Y Cao, YW Lu, C Been-Der, Q Zhang, SHL BARON, ... US Patent App. 16/606,791, 2020 | 12 | 2020 |
Theoretical analysis of time delays and streaking effects in XUV photoionization J Su, H Ni, A Becker, A Jaron-Becker Journal of Modern Optics 60 (17), 1484-1491, 2013 | 12 | 2013 |
Coloring aware optimization Y Zou, J Su, RJ Socha, CA Spence, DFS Hsu US Patent 10,670,973, 2020 | 6 | 2020 |
Numerical Simulations of Attosecond Streaking Time Delays in Photoionization J Su, HC Ni, A Becker, A Jaroń-Becker Chinese Journal of Physics 52 (1), 404-415, 2014 | 6 | 2014 |
Theoretical Analysis and Numerical Simulation of Attosecond Time Delays in Photoionization J Su University of Colorado at Boulder, 2014 | 5 | 2014 |
Modeling method for computational fingerprints J Su, Y Cheng, LIN Zchenxi, Y Zou, D Harutyunyan, EP Schmitt-Weaver, ... US Patent App. 17/634,309, 2022 | 4 | 2022 |
Method for training machine learning model to determine optical proximity correction for mask J Tao, SHL Baron, J Su, Y Luo, Y Cao US Patent App. 17/429,770, 2022 | 3 | 2022 |
Method for determining curvilinear patterns for patterning device Q Zhang, C Been-Der, RC Howell, J Su, Y Zou, YW Lu US Patent 11,232,249, 2022 | 3 | 2022 |