متابعة
Dirk Fahle
Dirk Fahle
Aixtron SE
بريد إلكتروني تم التحقق منه على aixtron.com
عنوان
عدد مرات الاقتباسات
عدد مرات الاقتباسات
السنة
The effect of the inversion channel at the AlN/Si interface on the vertical breakdown characteristics of GaN-based devices
H Yacoub, D Fahle, M Finken, H Hahn, C Blumberg, W Prost, H Kalisch, ...
Semiconductor Science and Technology 29 (11), 115012, 2014
762014
Demonstration of GaN integrated half-bridge with on-chip drivers on 200-mm engineered substrates
X Li, K Geens, W Guo, S You, M Zhao, D Fahle, V Odnoblyudov, ...
IEEE Electron Device Letters 40 (9), 1499-1502, 2019
642019
Effect of different carbon doping techniques on the dynamic properties of GaN-on-Si buffers
H Yacoub, C Mauder, S Leone, M Eickelkamp, D Fahle, M Heuken, ...
IEEE Transactions on Electron Devices 64 (3), 991-997, 2017
392017
Effect of carbon doping level on static and dynamic properties of AlGaN/GaN heterostructures grown on silicon
H Yacoub, T Zweipfennig, G Lükens, H Behmenburg, D Fahle, ...
IEEE Transactions on Electron Devices 65 (8), 3192-3198, 2018
332018
Analysis of an AlGaN/AlN super-lattice buffer concept for 650-V low-dispersion and high-reliability GaN HEMTs
L Heuken, M Kortemeyer, A Ottaviani, M Schröder, M Alomari, D Fahle, ...
IEEE Transactions on Electron Devices 67 (3), 1113-1119, 2020
302020
Electrical properties of quasi-vertical Schottky diodes
W Witte, D Fahle, H Koch, M Heuken, H Kalisch, A Vescan
Semiconductor Science and Technology 27 (8), 085015, 2012
292012
Effect of stress voltage on the dynamic buffer response of GaN-on-silicon transistors
H Yacoub, D Fahle, M Eickelkamp, A Wille, C Mauder, M Heuken, ...
Journal of Applied Physics 119 (13), 2016
252016
Integration of 650 V GaN power ICs on 200 mm engineered substrates
X Li, K Geens, D Wellekens, M Zhao, A Magnani, N Amirifar, B Bakeroot, ...
IEEE Transactions on Semiconductor Manufacturing 33 (4), 534-538, 2020
222020
45‐3: Invited Paper: Enabling the Next Era of Display Technologies by Micro LED MOCVD Processing
A Beckers, D Fahle, C Mauder, T Kruecken, AR Boyd, M Heuken
SID Symposium Digest of Technical Papers 49 (1), 601-603, 2018
202018
Interplay between C-doping, threading dislocations, breakdown, and leakage in GaN on Si HEMT structures
S Besendörfer, E Meissner, T Zweipfennig, H Yacoub, D Fahle, ...
AIP Advances 10 (4), 2020
182020
Effect of indium incorporation on optical and structural properties of m-plane InGaN/GaN MQW on LiAlO2 substrates
C Mauder, B Reuters, KR Wang, D Fahle, A Trampert, MV Rzheutskii, ...
Journal of crystal growth 315 (1), 246-249, 2011
162011
In situ SiN passivation of AlInN/GaN heterostructures by MOVPE
H Behmenburg, LR Khoshroo, C Mauder, N Ketteniss, KH Lee, ...
physica status solidi c 7 (7‐8), 2104-2106, 2010
162010
Vertical GaN devices: Process and reliability
S You, K Geens, M Borga, H Liang, H Hahn, D Fahle, M Heuken, ...
Microelectronics Reliability 126, 114218, 2021
142021
650 V p-GaN gate power HEMTs on 200 mm engineered substrates
K Geens, X Li, M Zhao, W Guo, D Wellekens, N Posthuma, D Fahle, ...
2019 IEEE 7th Workshop on Wide Bandgap Power Devices and Applications (WiPDA …, 2019
142019
Physical modeling of charge trapping effects in GaN/Si devices and incorporation in the ASM-HEMT model
M Pradhan, M Alomari, M Moser, D Fahle, H Hahn, M Heuken, ...
IEEE Journal of the Electron Devices Society 9, 748-755, 2021
112021
Epitaxial buffer structures grown on 200 mm engineering substrates for 1200 V E-mode HEMT application
A Vohra, K Geens, M Zhao, O Syshchyk, H Hahn, D Fahle, B Bakeroot, ...
Applied Physics Letters 120 (26), 2022
92022
The effect of AlN nucleation growth conditions on the inversion channel formation at the AlN/silicon interface
H Yacoub, M Eickelkamp, D Fahle, C Mauder, A Alam, M Heuken, ...
2015 73rd Annual Device Research Conference (DRC), 175-176, 2015
82015
On the anisotropic wafer curvature of GaN-based heterostructures on Si (1 1 0) substrates grown by MOVPE
C Mauder, ID Booker, D Fahle, H Boukiour, H Behmenburg, LR Khoshroo, ...
Journal of crystal growth 315 (1), 220-223, 2011
82011
Impact of gate dielectric thickness on the electrical properties of AlGaN/GaN MISHFETs on Si (111) substrate
M Eickelkamp, D Fahle, J Lindner, M Heuken, C Lautensack, H Kalisch, ...
physica status solidi (a) 207 (6), 1342-1344, 2010
82010
Characterization of charge injection and photovoltaic effects of hybrid inorganic-organic GaN/pentacene heterostructures
M Slawinski, M Weingarten, S Axmann, F Urbain, D Fahle, M Heuken, ...
Applied Physics Letters 103 (15), 2013
72013
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مقالات 1–20