| Water immersion optical lithography for the 45-nm node BW Smith, H Kang, A Bourov, F Cropanese, Y Fan Optical Microlithography XVI 5040, 679-689, 2003 | 77 | 2003 |
| Mask-induced polarization effects at high numerical aperture A Estroff, Y Fan, A Bourov, B Smith Journal of Micro/Nanolithography, MEMS and MOEMS 4 (3), 031107-031107-8, 2005 | 65* | 2005 |
| Approaching the numerical aperture of water immersion lithography at 193-nm BW Smith, A Bourov, Y Fan, LV Zavyalova, NV Lafferty, FC Cropanese Optical Microlithography XVII 5377, 273-284, 2004 | 61 | 2004 |
| 25 nm immersion lithography at 193 nm wavelength BW Smith, Y Fan, M Slocum, L Zavyalova Optical Microlithography XVIII 5754, 141-147, 2005 | 60 | 2005 |
| Water immersion optical lithography at 193 nm BW Smith, A Bourov, H Kang, F Cropanese, Y Fan, N Lafferty, ... Journal of Micro/Nanolithography, MEMS and MOEMS 3 (1), 44-51, 2004 | 52 | 2004 |
| Evanescent wave imaging in optical lithography BW Smith, Y Fan, J Zhou, N Lafferty, A Estroff Optical microlithography XIX 6154, 100-108, 2006 | 45 | 2006 |
| Novel glass-forming liquid crystals. 6. High-temperature glassy nematics FY Fan, SW Culligan, JC Mastrangelo, D Katsis, SH Chen, TN Blanton Chemistry of materials 13 (12), 4584-4594, 2001 | 44 | 2001 |
| Doping competition of anions during the electropolymerization of pyrrole in aqueous solutions Y Li, Y Fan Synthetic metals 79 (3), 225-227, 1996 | 43 | 1996 |
| Immersion microlithography at 193 nm with a Talbot prism interferometer A Bourov, Y Fan, FC Cropanese, NV Lafferty, LV Zavyalova, H Kang, ... Optical Microlithography XVII 5377, 1573-1578, 2004 | 37 | 2004 |
| Immersion lithography fluids for high NA 193 nm lithography J Zhou, Y Fan, A Bourov, N Lafferty, F Cropanese, L Zavyalova, A Estroff, ... Optical Microlithography XVIII 5754, 630-637, 2005 | 31 | 2005 |
| Amphibian XIS: an immersion lithography microstepper platform BW Smith, A Bourov, Y Fan, F Cropanese, P Hammond Optical Microlithography XVIII 5754, 751-759, 2005 | 28 | 2005 |
| Study of air-bubble-induced light scattering effect on image quality in 193-nm immersion lithography Y Fan, NV Lafferty, A Bourov, LV Zavyalova, BW Smith Optical Microlithography XVII 5377, 477-486, 2004 | 23 | 2004 |
| Edge-based full chip mask topography modeling Q Yan, H Zhang, E Croffie, L Zhang, Y Fan, P Brooker, Q Ren US Patent 8,918,743, 2014 | 21 | 2014 |
| Inorganic immersion fluids for ultrahigh numerical aperture 193 nm lithography J Zhou, Y Fan, A Bourov, BW Smith Applied optics 45 (13), 3077-3082, 2006 | 19 | 2006 |
| ILSim: a compact simulation tool for interferometric lithography Y Fan, A Bourov, L Zavyalova, J Zhou, A Estroff, N Lafferty, BW Smith Optical Microlithography XVIII 5754, 1805-1816, 2005 | 19 | 2005 |
| Novel glass-forming liquid crystals V. Nematic and chiral-nematic systems with an elevated glass transition temperature FY Fan, JC Mastrangelo, D Katsis, SH Chen Liquid Crystals 27 (9), 1239-1248, 2000 | 17 | 2000 |
| 3D resist profile modeling for OPC applications Y Fan, KK Koh, Q Yang, W Hoppe, B Kuechler, P Perampalam, M Miyagi, ... Optical Microlithography XXVI 8683, 401-411, 2013 | 15 | 2013 |
| Integrated mask and optics simulations for mask corner rounding effect in OPC modeling J Xue, Z Deng, K Koo, J Shiely, S Lee, Y Zhang, Y Fan, T Schmoeller Photomask Technology 2010 7823, 1022-1032, 2010 | 15 | 2010 |
| Hyper NA water immersion lithography at 193nm and 248nm BW Smith, Y Fan, J Zhou, A Bourov, L Zavyalova, N Lafferty, F Cropanese, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004 | 15 | 2004 |
| Assist feature placement based on a focus-sensitive cost-covariance field LD Barnes, BD Painter, Q Yan, Y Fan, J Li, A Poonawala US Patent 7,954,071, 2011 | 14 | 2011 |
