Generalized sine condition TT Elazhary, P Zhou, C Zhao, JH Burge Applied Optics 54 (16), 5037-5049, 2015 | 21 | 2015 |
Closed-form sag solutions for Cartesian oval surfaces CC Hsueh, T Elazhary, M Nakano, J Sasian Journal of Optics 40, 168-175, 2011 | 18 | 2011 |
Modeling mask scattered field at oblique incidence TM Tawfik, AH Morshed, D Khalil Optical Microlithography XXII 7274, 980-991, 2009 | 5 | 2009 |
Efficient approach to designing a Schmidt-Cassegrain objective for a remote sensing satellite TM Tawfik Applied optics 48 (35), 6832-6840, 2009 | 4 | 2009 |
Catadioptric optical system with multi-reflection element for high numerical aperture imaging M Nakano, JM Sasian-Alvarado, TT Elazhary US Patent 9,329,373, 2016 | 3 | 2016 |
Toward faster OPC convergence: advanced analysis for OPC iterations and simulation environment M Bahnas, M Al-Imam, T Tawfik Photomask Technology 2008 7122, 1320-1330, 2008 | 3 | 2008 |
Characterizing OPC model accuracy versus lens induced polarization effects in hyper NA immersion lithography TM Tawfik, E Tejnil Photomask Technology 2008 7122, 1310-1319, 2008 | 3 | 2008 |
New approach to determine best beam focus C Zuniga, TM Tawfik Optical Microlithography XXII 7274, 887-896, 2009 | 2 | 2009 |
Analytic optical design of generally non axi-symmetric optical systems TT Elazhary, P Zhou, C Zhao, J Burge International Optical Design Conference, ITh2A. 3, 2014 | 1 | 2014 |
Optical Design Method for Free Form Optics TT Elazhary, P Zhou, C Zhao, J Burge Freeform Optics, FM4B. 4, 2013 | 1 | 2013 |
Modeling the field diffracted from photo mask at oblique incidence TT Elazhary, AH Morshed, D Khalil Applied optics 49 (22), 4207-4216, 2010 | 1 | 2010 |
Optimizing gate layer OPC correction and SRAF placement for maximum design manufacturability T Brist, L Hong, A Yehia, T Tawfik, S Shang, K Sakajiri, JL Sturtevant Design for Manufacturability through Design-Process Integration 6521, 488-497, 2007 | 1 | 2007 |
Optical metrology for stability of beam pointing T Elazhary, M Hansen, R Huang, A Franklin International Optical Design Conference, JTu5A. 12, 2017 | | 2017 |
Hyper NA Catadioptric Imaging Lens TT Elazhary, M Nakano, M Miyawaki, J Sasián International Optical Design Conference, IM3B. 1, 2014 | | 2014 |
Generalized pupil aberrations of optical imaging systems TT Elazhary The University of Arizona, 2014 | | 2014 |
Hyper numerical aperture imaging lens using a thin multi reflection Catadioptric optical element TT Elazhary, M Nakano, J Sasián Optics Express 21 (13), 15809-15814, 2013 | | 2013 |
Improved process window modeling techniques C Zuniga, T Tawfik Optical Microlithography XXIII 7640, 1111-1118, 2010 | | 2010 |
Effect of SRAF placement on process window for technology nodes that uses variable etch bias AM Seoud, TM Tawfik Photomask Technology 2009 7488, 1059-1065, 2009 | | 2009 |
Tamer Mohamed Tawfik Ahmed Mohamed Elazhary | | |